The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 06, 2000

Filed:

Nov. 13, 1998
Applicant:
Inventors:

Cheng-Hung Yu, Kaohsiung, TW;

Ming-Der Chou, Hsinchu, TW;

Ching-Tsai Luo, Hsinchu Hsien, TW;

Tung-Hsing Tien, Hsinchu Hsien, TW;

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
F04B / ; F04B / ;
U.S. Cl.
CPC ...
417441 ; 417473 ; 4175551 ;
Abstract

A photoresist dispense pump receives photoresist from two pipelines, a first pipeline and a second pipeline, and pumps out the photoresist through a third pipeline. The photoresist dispense pump contains a first bellows and a second bellows receiving photoresist from the second pipeline, wherein the first bellows and the second bellows are separated by a partition. Photoresist is fed into the third pipeline from the second bellows. On the center region of the partition, there is a central diaphragm that allows photoresist to flow in a direction from the first bellows toward the second bellows, but not in the reverse direction.


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Yu, Cheng-Hung. (2000). Photoresist dispense pump (U.S. Patent No. 6071094). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6071094

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