The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 30, 2000
Filed:
Feb. 25, 1998
Applicant:
Inventors:
Takeshi Miyachi, Utsunomiya, JP;
Shinichi Hara, Kitakawabemachi, JP;
Assignee:
Canon Kabushiki Kaisha, Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L / ;
U.S. Cl.
CPC ...
378 34 ; 378 35 ; 216 12 ; 430-5 ;
Abstract
A mask holding system includes a chucking mechanism for holding a mask structure including a frame and a mask substrate having a rectangular window with a mask pattern, and a load mechanism for applying, at a position along an extension of a diagonal of the rectangular window, a load to the frame in a direction along the plane of the mask, whereby the mask pattern can be distorted isotropically with the application of the load along the mask plane.
Quick Actions:
Miyachi, Takeshi. (2000). Mask structure and mask holding mechanism for exposure apparatus (U.S. Patent No. 6069931). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6069931
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile