The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 30, 2000
Filed:
Oct. 29, 1997
Applicant:
Inventor:
Jae-Hee Ha, Chungcheongbuk-do, KR;
Assignee:
LG Semicon Co., Ltd., Cheongju, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H02N / ;
U.S. Cl.
CPC ...
361234 ; 361212 ; 279128 ;
Abstract
A method for restoring an electrostatic chuck force of an electrostatic chuck in a plasma apparatus includes the steps of only supplying a source gas, and applying a source power, but not an RF bias, to the plasma apparatus to induce a positive plasma. The positive plasma discharges any accumulated negative charge on the electrostatic chuck.