The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 30, 2000

Filed:

May. 29, 1998
Applicant:
Inventors:

Robert T Valley, South Burlington, VT (US);

Gary P Viens, Colchester, VT (US);

James R Weightman, Bristol, VT (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
B05D / ;
U.S. Cl.
CPC ...
427240 ; 118 52 ; 4273855 ; 437231 ;
Abstract

A spin-apply tool avoids contamination of a substrate back surface by providing exhaust along or beyond a periphery of a splash shield. The peripheral exhaust pulls a mist of droplets of liquid spun off the substrate away from the substrate. The spin-apply tool includes a spin chuck for holding the substrate, a basin extending around the chuck, a splash shield in the basin, and an exhaust substantially symmetric with the center of the substrate. The chuck surface defines a plane, and the splash shield extends as a ring around the chuck at an angle to that plane sufficient to deflect liquid flying off the chuck down to the basin. The basin may have a removable liner that can be cleaned and reused. Use of solvent to clean the backside of substrates is avoided. And a basin drain is eliminated, eliminating the need for any solvent consumption.


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