The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 23, 2000

Filed:

Apr. 09, 1999
Applicant:
Inventors:

Toshikazu Takata, Osaka, JP;

Motoki Kitagawa, Hyogo, JP;

Masato Tabuchi, Hyogo, JP;

Nobuo Yamada, Tokyo, JP;

Assignee:

Daiso Co., Ltd., Osaka, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C07F / ;
U.S. Cl.
CPC ...
556427 ; 4235662 ;
Abstract

An object of the present invention is to provide a method of obtaining high-purity sulfur-containing organosilicon compounds having polysulfide structure in a simple manner without treatment at high temperatures or under vacuum. According to the present invention, sulfur-containing organosilicon compounds represented by the formula (R.sup.1 --O).sub.3 --Si--R.sup.2 --S.sub.x --R.sup.2 --Si--(O--R.sup.1).sub.3 is obtained by reacting sulfur, an alkali metal and halogenoalkoxysilane represented by the formula (R.sup.1 --O).sub.3 --Si--R.sup.2 --X (wherein R.sup.1 is a monovalent C.sub.1-5 hydrocarbon, R.sup.2 is a divalent C.sub.1-9 hydrocarbon, X is a halogen, and x is an integral number of 1 to 8).


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