The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 16, 2000
Filed:
Jun. 10, 1998
David D Crouch, Corona, CA (US);
Joseph Santoru, Agoura Hills, CA (US);
Robin J Harvey, Thousand Oaks, CA (US);
Raytheon Company, Lexington, MA (US);
Abstract
Improved magnetron oscillators that controllably form a plasma within each of its resonant cavities to rapidly change the resonant frequency of each cavity. The present invention also provides for frequency tuning methods for use with magnetron oscillators. The plasma is controllably formed in one or more subcells of each resonant cavity in a manner that alters the electromagnetic field within each cavity. Preferably, a magnetized collisional plasma is controlled to rapidly change the resonant frequency of each cavity. However, many types of plasmas may be used to implement the present invention. Controlling formation of the plasma within each cavity tunes the magnetron oscillator on a submillisecond time scale.