The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 16, 2000
Filed:
Oct. 09, 1996
Hyo Soo Jeong, Seoul, KR;
Han Kim, Kyonggi-Do, KR;
Jung Ok Choi, Seoul, KR;
Moung Jae Kim, Kyonggi-Do, KR;
Institute for Advanced Engineering, Seoul, KR;
Abstract
The present invention relates to an apparatus for manufacturing a diamond film having a large area which is used for a field emission display (FED) and a manufacturing method thereof. The apparatus for manufacturing a diamond film having a large area according to the present invention comprises a pulse laser generating system for generating a pulse laser beam, a laser beam scanner for scanning said pulse laser beam, and a vacuum chamber which includes a target and a substrate holder, wherein said laser beam having passed said laser beam scanner is irradiated on said target, and wherein a substrate on which a diamond film is to be formed by a plume produced from said target is set up to said substrate holder. The diamond film according to the present invention has a uniform electrical and mechanical properties and can be obtained in a short time period and with a uniform width and a large area. The diamond film manufactured according to the present invention can be also used for manufacturing emitters for FED having a large area and can increase the efficiency of the target because of the possibility of using the overall area thereof.