The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 16, 2000
Filed:
Aug. 14, 1998
Applicant:
Inventor:
William D Taylor, Southbury, CT (US);
Assignee:
PlasmaSil, LLC, St. Peters, MO (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C / ;
U.S. Cl.
CPC ...
156345 ; 1187 / ; 118715 ;
Abstract
A novel gas discharge apparatus for use in a plasma etching system is disclosed. Several components of the gas discharge apparatus including the annular outer chimney, annular outer chimney clamp and annular insulator collar are modified to allow increased egress of particulate matter generated by the etching process away from the substrate being figured. This increased egress results in a significant reduction of contaminants contacting the substrate surface.
Taylor, William. (2000). Gas discharge apparatus for wafer etching systems (U.S. Patent No. 6063235). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6063235
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile