The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 09, 2000
Filed:
Jan. 30, 1998
Applicant:
Inventors:
Jane B Wong Shing, Aurora, IL (US);
John R Hurlock, Hickory Hills, IL (US);
Assignee:
Nalco Chemical Company, Naperville, IL (US);
Primary Examiner:
Int. Cl.
CPC ...
D21H / ;
U.S. Cl.
CPC ...
1621682 ; 1621683 ; 162175 ; 162183 ;
Abstract
A method for improving retention and drainage performance in a papermaking process is disclosed. The method comprises forming an aqueous cellulosic papermaking slurry, adding an effective amount of a hydrophilic dispersion polymer to the slurry, draining the slurry to form a sheet and drying the sheet. The hydrophilic dispersion polymer is preferably a copolymer of dimethylaminoethyl acrylate methyl chloride quaternary and acrylamide.