The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 02, 2000

Filed:

Nov. 12, 1996
Applicant:
Inventor:

Peter J Klopotek, Framingham, MA (US);

Assignee:

Summit Technology, Inc., Waltham, MA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
A61N / ;
U.S. Cl.
CPC ...
606-5 ; 606-3 ; 606 10 ; 606 13 ; 606 17 ; 359851 ;
Abstract

A beam profiler comprising: an intensity modifier constructed and arranged to separately modify the intensity profile of different subbeam portions of an initial beam to thereby create respective subbeams each having a respective predetermined modification; and a subbeam-directing optical system constructed and arranged to direct the multiple subbeams along respective subbeam beam paths that substantially overlap in an overlap plane, whereby, a resulting beam of radiation is created at the overlap plane that has an intensity profile equal to the optical incoherent summation of the predetermined intensity profiles of said overlapping subbeams. The intensity modifier preferably comprises an array of intensity-modifying profiling elements disposed across the initial beam each producing a corresponding subbeam.


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