The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 02, 2000
Filed:
Apr. 02, 1998
Ichiro Miyazawa, Tokyo, JP;
NEC Corporation, Tokyo, JP;
Abstract
A semiconductor manufacture apparatus extending chemical life and reducing chemical replenishing amounts, continuously removes excessive moisture content generated by reaction within the apparatus and can perform cleaning and stripping with stable cleaning performance and stripping performance as a result of removing moisture content in the chemicals. The semiconductor manufacture apparatus is adapted for cleaning a semiconductor substrate or stripping a photoresist applied on the surface of the semiconductor substrate by chemicals, with a moisture separating device preferentially separating moisture content from the chemicals being provided within a passage for recirculating the chemicals within the apparatus.