The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 25, 2000
Filed:
Jun. 22, 1998
Shingo Nishikawa, Tokyo, JP;
Dai Nippon Printing Co., Ltd., Tokyo, JP;
Abstract
The invention provides a method of recording, and replicating a reflection hologram, which enables reference light or object light to strike on a holographic recording material at an angle of incidence that is approximate to 90.degree. or larger than the critical angle. With the reflection hologram-replicating method, the reflection hologram can be continuously replicated by allowing replicating illumination light to strike on the holographic recording material at any desired angle of incidence other than verticality. A wavefront conversion type transmission hologram 1' is located in close contact with one surface side of a reflection hologram recording material 6 while a reflection hologram plate 7 is located in close contact with the other surface side thereof. The reflection hologram plate 7 is replicated by interference in the photographic material 6 between light 5 produced upon incidence of illumination light 4 on the wavefront conversion type transmission hologram 1', in which at least one of the wavefront shape and direction thereof is converted, and light 8 produced upon diffraction of light 5 by striking on the plate 7 through the holographic recording material 6.