The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 25, 2000
Filed:
Jan. 17, 1997
Shin-Puu Jeng, Plano, TX (US);
Texas Instruments Incorporated, Dallas, TX (US);
Abstract
In accordance with the present invention, an improved method and structure is provided for integrating polymer and other low dielectric constant materials, which may have undesirable properties, into integrated circuit structures and processes, especially those requiring multiple levels of interconnect lines. Since the bond is typically weak between low-k materials such as polymers 18 and traditional dielectrics such as SiO.sub.2 22, the weak bonding may cause delamination or other problems during subsequent processing. The present invention increases yield and simplifies processing subsequent to application of the low-k material by providing an adhesion/protective layer 20 between the low-k material 18 and the intermetal dielectric 22. A preferred embodiment is a spun-on layer 20 of HSQ cured on a hotplate prior to application of the SiO.sub.2 intermetal dielectric.