The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 25, 2000
Filed:
May. 26, 1998
Hermanus L Peek, Eindhoven, NL;
Daniel W Verbugt, Eindhoven, NL;
U.S. Philips Corporation, New York, NY (US);
Abstract
It may be necessary to provide conductors at very small distances from one another when electronic circuits, for example integrated circuits, are manufactured on an insulating substrate. A multilayer wiring system is often used in that case. The invention renders it possible to make very small inter-electrode gaps in a single conductor layer. To achieve this, the conductor layer is covered with a comparatively thick dielectric layer 4, 5 in which windows 8 are formed which extend over only part of the dielectric layer. Then an auxiliary layer 9 is provided which has depressions at the areas of the windows 8. Windows 11 are formed in the dielectric layer by anisotropic etching-back with dimensions which are substantially smaller than the dimensions of the original windows 8. The windows 11 may be used as etching windows or oxidation windows for the subsequent formation of the definitive conductor pattern.