The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 18, 2000
Filed:
Sep. 30, 1998
Hirofumi Ichinose, Tsuzuki-gun, JP;
Ippei Sawayama, Machida, JP;
Akio Hasebe, Nagahama, JP;
Tsutomu Murakami, Nara, JP;
Masaya Hisamatsu, Kawasaki, JP;
Satoshi Shinkura, Tsuzuki-gun, JP;
Yukie Ueno, Nara, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
An etching apparatus is described comprising a substrate holding segment for holding a substrate with a portion to be etched, an electrolytic bath for maintaining an electrolyte solution therein, a locomotive mechanism for moving the substrate holding segment in order to immerse the substrate held on the substrate holding segment in the electrolyte solution maintained in the electrolytic bath, and a counter electrode holding segment for holding a counter electrode having a pattern corresponding a desired etching pattern to be formed at the portion to be etched of the substrate. The counter electrode is positioned to oppose the substrate held on the substrate holding segment.