The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 11, 2000
Filed:
Mar. 25, 1997
Takayuki Arai, Kasukabe, JP;
Enplas Corporation, Kawaguchi, JP;
Yasuhiro Koike, Yokohama, JP;
Abstract
A surface light source device of side-light type enables concentrated output of illumination light to a frontal direction. A flux having clear directivity is outputted from window portions 1w on an emitting surface 5 of a light guide plate 1 with emitting directivity. This flux is represented by a beam C01 outputted in a direction at an angle of 70.degree.. A flux C02 incident on reflection portions 1r is returned to the light guide plate 1 and is given an opportunity of output from the window portions 1w again. The flux C01 having escaped from the window portions 1w to an air layer AR is obliquely incident on flat regions 14g of a propagation direction characteristics modifier 14, and a degree of parallelization of the flux in a propagation direction is improved. The flux is blocked by the reflection portions 1r from being incident on a notch portion (uneffective area) between the flat regions 14g. After total reflection by a total reflection surface 14b of each projection element 14c, the flux is outputted from a flat outside surface 14h to a frontal direction without degrading the improved degree of parallelization. The projection elements 14c may be two-dimensionally arrayed. A prismatic groove or a cylindrical lens array may be formed on the outside surface 14h to two-dimensionally enhance the degree of parallelization.