The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 11, 2000

Filed:

Jun. 16, 1997
Applicant:
Inventors:

Michael Denda, Senden, DE;

Christian Duelk, Ulm, DE;

Robert Gerberich, Blaustein, DE;

Norbert Wiesheu, Guenzburg, DE;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C06D / ; C07C / ; C01B / ; C01B / ;
U.S. Cl.
CPC ...
252376 ; 252373 ; 4236481 ; 4234182 ; 429 13 ;
Abstract

A process for operating a system for water vapor reforming of methanol includes a mixture preparation step for preparing a water vapor/methanol mixture from water and methanol, which mixture is subsequently introduced into a reforming reactor in a quantity which depends on the load condition of the system. According to the invention, the water vapor/methanol mixture ratio of the water vapor/methanol mixture introduced into the reforming reactor is maintained at a predeterminable desired value unaffected by short-term load changing operations, to avoid undesirable short-term increases of the CO-concentration in the reformate.


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