The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 11, 2000
Filed:
Feb. 02, 1998
William N Osborne, Ringwood, NJ (US);
Petrus J Prinsen, Eindhoven, NL;
Edwin A Montie, Eindhoven, NL;
Edward C Cosman, Eindhoven, NL;
Philips Electronics N. A. Corporation, New York, NY (US);
Abstract
A method for providing a resistive focusing lens structure for an electron beam device including forming a suspension of particles of a mixture of, by weight, of about 33-50% of an oxidic conductive material including about 40-60% of a lead ruthenate, about 25-38% of a lead titanate and about 2-15% of a ruthenium oxide, and of about 50-67% of a glass including about 30-40% of silicon dioxide (SiO.sub.2), about 3-7.5% alumina (Al.sub.2 O.sub.3), and about 53-67% of lead oxide (PbO) in a suspending medium consisting essentially of a non-acidic liquid having a boiling point of less than 150.degree. C., applying the suspension to an inside surface of a glass member to thereby provide a coating of the particles on the inside surface, firing the coating at a temperature of 700-900.degree. C. and before of after firing the coating, patterning the coating. The present method provides highly reproducible resistive focusing lens structures.