The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 11, 2000
Filed:
Oct. 09, 1997
Shin Ishimatsu, Yokohama, JP;
Masaki Inaba, Kawasaki, JP;
Tsutomu Abe, Isehara, JP;
Akira Goto, Yokohama, JP;
Masao Furukawa, Yokohama, JP;
Kouichi Omata, Kawasaki, JP;
Toshinori Hasegawa, Yokohama, JP;
Miki Ito, Yokohama, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
A laser processing method comprises at least one of a laser light source, a beam shaping optical system for shaping laser beams, a mask having specific patterns corresponding to the processing configuration of a work, an illumination optical system for illuminating the mask, and a projection optical system for focusing the pattern images of the mask on the processing surface of the work by a specific magnification. This mask is provided with an extinct portion smaller than the quotient of the resolution and specific magnification of the projection optical system. With the method thus arranged, a work can be processed to provide complicated three-dimensional grooves having irregularities in the direction of laser irradiation by one-time processing. Also, the extinct portions make it possible to easily and finely adjust the extinction so that the precision of work processing is enhanced.