The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 04, 2000
Filed:
Nov. 26, 1997
Sebastien Roy, Pennington, NJ (US);
NEC Research Institute, Inc., Princeton, NJ (US);
Abstract
A method for solving the stereo correspondence problem transforms the problem into a maximum-flow problem. Once solved, the minimum-cut associated to the maximum-flow results in a disparity surface for the entire image at once. This global approach to stereo analysis provides a more accurate and coherent depth map than the traditional line-by-line stereo method. Moreover, the optimality of the depth surface is guaranteed and can be shown to be a generalization of the dynamic programming approach that is widely used in standard stereo. Results show improved depth estimation as well as better handling of depth discontinuities. While the worst case running time is O(n.sup.3 d.sup.3), the observed average running time is O(n d.sup.1.4) for an image size of n pixels and depth resolution d.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile