The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 04, 2000
Filed:
Jul. 02, 1998
Applicant:
Inventors:
Eric Verschueren, Merksplas, BE;
Bavo Muys, Eppegem, BE;
Jan Dierckx, Boom, BE;
Jean Van Trier, Sint-Amands, BE;
Wim Cortens, Booischot, BE;
Assignee:
Agfa-Gevaert, N.V., Mortsel, BE;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03C / ;
U.S. Cl.
CPC ...
4302701 ; 430531 ; 430532 ; 430533 ; 427535 ; 427536 ;
Abstract
The present invention provides a method for obtaining a lithographic base comprising on a hydrophobic support a hydrophilic layer contiguous to said support containing a non-gelatinous hydrophilic (co)polymer or (co)polymer mixture, characterized in that said hydrophobic support is treated with a plasma treatment with an applied power density during the plasma treatment of at least 70 W min/m.sup.2 before applying to said support said hydrophilic layer.