The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 04, 2000
Filed:
Mar. 18, 1998
Nobuo Kushibiki, Kanagawa, JP;
Kikuko Takeuchi, Kanagawa, JP;
Dow Corning Asia, Ltd., Tokyo, JP;
Abstract
A method for forming a low surface energy coating for electrophotographic photosensitive body substrates does not require performing a physical surface reforming treatment such as corona discharge, plasma treatment, and the like. The process comprises: forming on the substrate at least one polysiloxane coating material, (B), that has a water contact angle greater than the water contact angle of the substrate; and thereafter forming an outermost surface coating material, (A), on top of coating material (B). The water contact angle of coating material (B) is smaller than the water contact angle of coating material (A). Coating material (A) comprises finely divided silica and a resin of the formula RSiO.sub.3/2, wherein not less than 1 mol % and not more than 80 mol % of the R groups are fluorohydrocarbon groups of 3 to 12 carbon atoms.