The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 04, 2000
Filed:
Sep. 28, 1998
Shouji Yajima, Sagamihara, JP;
Norihisa Yamaguchi, Sagamihara, JP;
Kazuhiro Nakagawa, Sagamihara, JP;
Hiroki Jinbo, Yokohama, JP;
Nikon Corporation, Tokyo, JP;
Abstract
An apparatus is provided for synthesizing a silica glass ingot. The appartus includes a stage having a target plate thereover, the target plate being rotatable relative to the stage around a predetermined vertical axis, and a furnace for reacting material gas with combustion gas to synthesize the silica glass ingot on the target plate; the furnace having an opening at its bottom. The appratus further includes an elevation system that moves the stage in a vertical direction parallel to the predetermined vertical axis so as to vertically move the target plate through the opening of the furnace, the elevation system supporting the stage from at least one side of the stage and lacking a structure directly below the stage that would substantially interfere with the vertical movement of the stage.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile