The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 28, 2000
Filed:
Jun. 29, 1998
Satoshi Akimoto, Utsunomiya, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
An exposure apparatus, which has a projection optical system, a Z-stage movable in the optical axis direction of the projection optical system, an X-Y stage movable in a planar direction perpendicular to the optical axis direction, and a sensor for measuring the positional relationship between a substrate placed on the Z-stage and a predetermined position in the optical axis direction and/or any tilt of the substrate, sequentially moves and aligns the X-Y stage to change the area to be exposed on the substrate, executes a measurement using the sensor, and exposes while correcting the positional relationship between the substrate and the predetermined position in the optical axis direction and/or any tilt of the substrate in accordance with the measurement result, has a control unit for adjusting the measurement start timing of the sensor in correspondence with a change in area to be exposed on the substrate.