The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 28, 2000
Filed:
Mar. 14, 1998
Donald Milan Tennant, Freehold, NJ (US);
Lucent Technologies Inc., Murray Hill, NJ (US);
Abstract
The specification describes a spatial autocorrelation technique for measuring ultrafine linewidths of the order of tens of nanometers and less. Two beams of actinic radiation are used to draw parallel lines in a resist material. Each beam is adjusted to deliver a dose below the threshold for printing a feature, but when combined the dose is sufficient to print a line feature. During exposure the separation between beams is changed in controlled spatial steps until the beams cross one another. During some of the steps at least a portion of the beams will be coincident thus producing printable features. The resist is developed to print the features where the beams are coincident. The lines are below the resolving power of an optical microscope but their presence is discernible. The width of the line is determined from the number of lines printed and the size of the spatial steps.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile