The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 21, 2000
Filed:
Sep. 16, 1997
Terizhandur S Ramakrishnan, Bethel, CT (US);
Lawrence M Schwartz, Westport, CT (US);
Edmund J Fordham, Danbury, CT (US);
William E Kenyon, Ridgefield, CT (US);
David J Wilkinson, Ridgefield, CT (US);
Schlumberger Technology Corporation, Ridgefield, CT (US);
Abstract
In this invention a new interpretation methodology has been developed. A pore structure model is used to compute the relaxation behavior. This model is then used as the kernel of a best-fit inversion scheme against the measured data, in contrast to inverting for a T.sub.2 distribution that relies on regularization. Parameters of the model are obtained by 'best fitting' the model with the data. The method considers a geometrical or physical model comprising both intergranular and intragranular porosity (microporosity). The NMR relaxation is computed by one of the several methods. The model is compactly represented by a set of physical parameters that are iterated upon until a match with relaxation data is obtained in the best fit sense. The result is obtained in terms of these physical parameters, and then integrated with other types of measurements.