The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 21, 2000

Filed:

Jan. 20, 1998
Applicant:
Inventors:

Jacques Rioland, Eaubonne, FR;

Paul Thibout, Guyancourt, FR;

Patrice Jano, Seine Port, FR;

Assignee:

Thomson-CSF, Paris, FR;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G11B / ;
U.S. Cl.
CPC ...
2502019 ; 356363 ; 356121 ;
Abstract

A device to control the aiming and focusing of laser systems on a target comprises at least one reflecting false target (21) positioned and oriented substantially identically to the target (3), a lens (12) for the focusing of the beam on this false target, a separator device (11), a wavefront analyzer (35), a mirror (33) and a semi-reflective plate (32), the beam (1) getting focused, at the end of the system, on the false target (21) after getting reflected on the separator device (11). A part (31) of the beam with the same wavelength as that of the part reflected by the separator device (11) goes through this device and the semi-reflective plate (32) to get directed towards the wavefront analyzer (35). The beam reflected by the false target (21) goes through the separator grating (11) to get reflected on the mirror (33) and the semi-reflective plate (32) to get directed towards the wavefront analyzer (35). The aiming and focusing measurements are carried out by means of this wavefront analyzer (35) through a differential analysis between the two wavefronts. Application especially to power lasers.


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