The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 21, 2000
Filed:
Mar. 15, 1999
Applicant:
Inventors:
Takeshi Hori, Tokyo, JP;
Tsutomu Uezono, Tokyo, JP;
Tomoyuki Yoshii, Tokyo, JP;
Yasuhiro Funayama, Tokyo, JP;
Assignee:
NEC Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03G / ;
U.S. Cl.
CPC ...
430127 ; 430132 ; 430133 ; 430134 ;
Abstract
A method for manufacturing a photoreceptor includes the steps of consecutively forming a transparent conductive layer, a photoconductive layer, insulation layer and an electrode layer on a transparent support member, covering the electrode layer with a photo-setting dry film having a mask pattern therein, and sand-blasting the electrode layer and the insulation layer through the mask pattern to form an array of pores in the electrode layer and the insulation layer. A porous layer having a uniform thickness and uniform arrangement of pores can be obtained.