The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 14, 2000

Filed:

Mar. 13, 1998
Applicant:
Inventors:

Hiroaki Yoda, Kawasaki, JP;

Yuichi Ohsawa, Tokyo, JP;

Takeo Sakakubo, Yokohama, JP;

Masashi Sahashi, Yokohama, JP;

Jun Ito, Ome, JP;

Kazushi Tanimoto, Tokyo, JP;

Assignee:

Kabushiki Kaisha Toshiba, Kawasaki, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G11B / ; G11B / ;
U.S. Cl.
CPC ...
360103 ;
Abstract

A magnetic head has a recording/reproducing element which is embedded in an insulation layer made of an AlO.sub.x thin film and a leading end of which is positioned at a medium opposed face. A high-hardness coating layer or a high-thermal conductivity coating layer made of diamond-like carbon or the like is disposed on a peripheral region of the medium opposed face, excluding the leading end of the recording/reproducing element and a region in the neighborhood thereof. Even in the case where the magnetic head is applied to a magnetic disk apparatus of contact recording/reproducing system, it is possible to greatly restrain wear of the leading end of the recording/reproducing element and the region in the neighborhood thereof. Further, the heat dissipation characteristic of the leading end of the recording/reproducing element can be improved greatly. The dishing of the leading end of the recording/reproducing element can be reduced to a great extent by so etching the peripheral region of the medium opposed face that the leading end of the recording/reproducing element is projected; forming the high-hardness coating layer on an etched region; and processing the projected region by wear in a final process.


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