The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 14, 2000
Filed:
Sep. 12, 1995
Tatsuoki Nagaishi, Itami, JP;
Hideo Itozaki, Itami, JP;
Sumitomo Electric Industries, Ltd., Osaka, JP;
Abstract
The method for forming superconducting films of complex oxide compounds in a process chamber according to the present invention includes the steps of: (a) placing a substrate near a target in a chamber so that the substrate is positioned to be generally perpendicular to a surface of the target, the target comprising a target material of complex oxide compounds; and (b) irradiating a laser beam to the surface of the target to vaporize or sublime the target material forming over the target a flame-shaped plume having on axis generally perpendicular to the surface of the target so that the target material is deposited onto a surface of the substrate, the surface of the substrate maintaining the position to be generally perpendicular to the surface of the target and being generally parallel to the axis of the plume, wherein the target rotates on an axis perpendicular to the surface of the target and the substrate rotates on an axis perpendicular to the surface of the substrate (off-axis geometry), and wherein the laser beam scans the surface of the target. The chamber pressure P.sub.c for the off-axis geometry laser ablation should be 0.8 Torr.ltoreq.P.sub.C.ltoreq. 1.5 Torr for Y.sub.1 Ba.sub.2 Cu.sub.3 O.sub.7-x film.