The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 14, 2000

Filed:

May. 12, 1998
Applicant:
Inventors:

Ming-Shyong Tsai, Tainan Hsien, TW;

Li-Mei Chen, Hsinchu, TW;

Yue-Chin Yeh, Taipei, TW;

Chiu-Chih Hsieh, Taipei, TW;

Ying-Tsung Chen, Chiayi, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C07K / ;
U.S. Cl.
CPC ...
438692 ; 438693 ; 51307 ; 51309 ; 451 41 ; 451 28 ; 451 36 ; 29 9001 ;
Abstract

The present invention provides a polishing composition which comprises 100 weight part of water; 0.5 to 20 weight part of boehmite, a hydroxide of aluminum, pseudoboehmite or mixtures thereof; 1 to 50 weight part of aluminum oxide (Al.sub.2 O.sub.3); and 1 to 20 weight part of an acidic solution. The polishing composition of the present invention is a thixotropic fluid and displays satisfactory suspension properties. Therefore, it is very suitable for use as a polishing slurry.


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