The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 14, 2000

Filed:

Sep. 13, 1999
Applicant:
Inventors:

Markus Fuessel, Munich, DE;

Friedrich Jacob, Munich, DE;

Manfred Fuersich, Taufkirchen, DE;

Gudrun Taresch, Munich, DE;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03C / ;
U.S. Cl.
CPC ...
430359 ; 430362 ;
Abstract

A method and a device for reproducing originals onto light-sensitive materials is described where unsharp masks for changing the reproduction process or the density values to be reproduced are determined from the density values of the original and from pre-specified gradation factors. Several different gradation factors are used to determine the mask of an original.


Find Patent Forward Citations

Loading…