The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 14, 2000

Filed:

Nov. 26, 1997
Applicant:
Inventor:

David A Richards, Rochester, NY (US);

Assignee:

Eastman Kodak Company, Rochester, NY (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B29D / ;
U.S. Cl.
CPC ...
216 24 ; 216 26 ;
Abstract

A method for precision polishing non-planar, aspherical surfaces in substrates having variations in figure which are within an order of about ten wavelengths (10 .lambda.) is performed by coating the non-planar, aspherical surface with a thin, uniform layer of material, single-point-diamond turning the layer to achieve a layer surface with an excellent surface figure, and etching the layer surface down into the substrate to completely remove the layer thereby transferring the excellent surface figure to the substrate.


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