The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 14, 2000
Filed:
Apr. 25, 1997
Nobuya Seko, Tokyo, JP;
Yoshinori Tomihari, Tokyo, JP;
NEC Corporation, , JP;
Abstract
There is provided a method of fabricating a field emission cold cathode, including the steps, in sequence, of (a) forming a first insulating layer on a substrate and further forming a first electrode layer on first insulating layer, (b) forming at least one opening in first electrode layer, (c) forming a second insulating layer on first electrode layer and further forming a second electrode layer on second insulating layer, (d) forming at least one opening in second electrode layer, (e) optionally repeating steps (c) and (d) predetermined number of times, (f) forming a cavity extending from an uppermost electrode layer to substrate, (g) forming a first sacrifice layer around a first opening of a first electrode layer, (h) forming a second sacrifice layer around a second opening of a second electrode layer, and (i) forming an emitter electrode on substrate with first sacrifice layer being used as a mask. The method enables a field emission cold cathode including a focusing electrode to have small misalignment between an opening of a first opening of a first electrode layer and an emitter electrode to the same degree as that of a field emission cold cathode including no focusing electrode.