The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 14, 2000
Filed:
Mar. 18, 1998
Applicant:
Inventor:
Oh Eui-Yeol, Gunpo, KR;
Assignee:
Frontec Incorporated, Sendai, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B08B / ;
U.S. Cl.
CPC ...
134 61 ; 134 953 ; 1341022 ; 134902 ;
Abstract
Provided is an apparatus for producing semiconductor and other devices, which can improve the quality of deposited films and increase the yield of produced devices in comparison with the conventional apparatus. The apparatus of the invention comprises a plurality of dry treatment chambers (7a, 7b, 7c, 7d, 7e), a transfer room (6) interconnecting the dry treatment chambers (7a, 7b, 7c, 7d, 7e), loading/unloading chambers (8a, 8b, 8c, 8d), and a cleaning apparatus (13). The transfer room (6) and the cleaning apparatus (13) are directly or indirectly connected to each other.