The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 14, 2000

Filed:

May. 06, 1997
Applicant:
Inventors:

Leon J Woznow, North Vancouver, British Columbia, CA;

Paul O Toom, Delta, British Columbia, CA;

Assignee:

Other;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01B / ;
U.S. Cl.
CPC ...
33533 ; 33775 ;
Abstract

A surface profiler 10 has a forward support wheel 20, an intermediate support wheel 21 and a rearward support wheel 22 for travelling along a surface, the profile of which is to be measured. The wheels 20, 21, 22 are spaced apart at predetermined distances longitudinally of the direction of travel for travel along substantially the same line along the surface. The profiler 10 further comprises a forward frame member 40 supported by the forward and intermediate support wheels 20, 21 and a rearward frame member 41, supported by the intermediate and rearward support wheels 21, 22. The forward and rearward frame members 40, 41 are pivotally connected together about the rotation axis of the intermediate support wheel 21. Angle measuring means 30 is provided for measuring the relative orientation of the forward and rearward frame members 40, 41 with respect to the rotation axis of the intermediate support wheel 21. The profiling apparatus 10 also includes an inclination measuring means 32 for referencing one of the forward and rearward frame members 40, 41 to a reference position which is independent of the forward and rearward frame members 40, 41, such as the horizonal position. A method of measuring the profile of a surface is also provided.


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