The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 07, 2000

Filed:

Jan. 22, 1998
Applicant:
Inventors:

Dirk K Broddin, Edegem, BE;

Jean-Pierre J Slabbaert, Boechout, BE;

Frank A Deschuytere, Beveren, BE;

Robert F Janssens, Geel, BE;

Werner F Heirbaut, Sint-Niklaas, BE;

William E Nelson, Dallas, TX (US);

Venkat V Easwar, Cupertino, CA (US);

Assignees:

Texas Instruments Incorporated, Dallas, TX (US);

Agfa-Gevaert N.V., Mortsel, BE;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
B41J / ; G03G / ; G03G / ;
U.S. Cl.
CPC ...
347131 ; 399 46 ; 399 49 ;
Abstract

A method is described to control the maximum density and the pixel profile of microdots produced by a binary or multilevel electrophotographic device. In various embodiments, from the maximum development potential. The working point of the device is established by imposing a relation between charge level, discharge level and saturation voltage level of the photosensitive element. This allows to achieve consistent output densities, irrespective of the environmental parameters, such as relative humidity and temperature.


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