The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 07, 2000
Filed:
Mar. 19, 1997
Applicant:
Inventor:
Katsuya Itoh, Yokkaichi, JP;
Assignee:
Kabushiki Kaisha Toshiba, Kawasaki, JP;
Primary Examiner:
Int. Cl.
CPC ...
H01L / ;
U.S. Cl.
CPC ...
438673 ; 438713 ; 438720 ; 438945 ;
Abstract
A barrier metal film, Al alloy film and anti-reflective film are sequentially deposited on a surface to form an interconnect pattern by a photolithography technique. An overhanging portion of the anti-reflective film is etched away by a plasma of a Cl.sub.2 /BCl.sub.3 -mixed gas. Then an insulating interlayer is deposited on a resultant semiconductor structure.
Itoh, Katsuya. (2000). Semiconductor device having an anti- reflective film on an interconnect (U.S. Patent No. 6033986). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6033986
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile