The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 29, 2000
Filed:
Dec. 09, 1998
William P Robinson, Thousand Oaks, CA (US);
Michael J Little, Woodland Hills, CA (US);
Eric A Gifford, Newbury Park, CA (US);
MEMSolutions, Inc., Westlake Village, CA (US);
Abstract
The present invention provides a Schlieren projection system with a large aperture reflective imager. The combination of a beam-addressed CCM design with flat-panel manufacturing techniques configuration produces a large aperture imager that overcomes the problems of limited deflection range, high beam current, electrostatic instability and limited resolution associated with known electrostatically-actuated micromirror targets. The CCM imager includes a thin insulating membrane that decouples the electron beam from the micromirror array. Decoupling also allows the mirror to be designed to optimize reflectivity, exhibit a higher resonant frequency for better video performance, and be fabricated simultaneously with the hinges. The CCM imager is fabricated using flat-panel manufacturing techniques that are ideally suited to producing large aperture devices at low cost.