The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 29, 2000
Filed:
Feb. 02, 1996
Toshiki Shinmura, Tokyo, JP;
NEC Corporation, Tokyo, JP;
Abstract
A collimated sputtering method that enables to improve the deposition rate per applied unit power and the bottom coverage is provided. This method contains a step of controlling a condition of a glow discharge in a chamber to increase a rate of a sputtered species that is contained in a specified angle range and that passes through a collimator. The rate of the sputtered species that can pas through the collimator is increased. Also, the rate of the passed species travelling parallel to the normal direction is increased. The sputtering surface of the target contains a crystal plane that is approximately perpendicular to a crystal axis having a shortest interatomic distance.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile