The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 22, 2000
Filed:
Nov. 16, 1998
Takeo Hashimoto, Tokyo, JP;
NEC Corporation, Tokyo, JP;
Abstract
A scanning reduction projection aligner has an image field twice wider than an image field of a stepping reduction production aligner, and plural first latent images and plural second latent images are formed in a first photo resist layer and a second photo resist layer spread over a semiconductor wafer in different phases of a fabrication process of a semiconductor device by using the stepping reduction projection aligner and the scanning reduction projection aligner, respectively; when the first latent images are formed in the first photo resist layer, narrow areas of the first photo resist layer are aligned with a reticle by using an alignment mark on the semiconductor wafer at every other pattern transfer so that each second latent image is exactly superimposed on one of the pairs of first latent images in spite of incorrect perpendicularity of orthogonal coordinates virtually determined over the semiconductor wafer.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile