The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 22, 2000
Filed:
Jan. 04, 1999
Applicant:
Inventors:
William John Adair, Jericho, VT (US);
David Shawn O'Grady, Jericho, VT (US);
Song Peng, South Burlington, VT (US);
Assignee:
International Business Machines Corporation, Armonk, NY (US);
Primary Examiner:
Int. Cl.
CPC ...
G03F / ;
U.S. Cl.
CPC ...
430-5 ;
Abstract
The present invention provides a method and an apparatus for tuning the phase shifting of a phase shift mask having an attenuating phase shifting material providing at least 160.degree. of phase shift. The method comprising the utilization of a phase measurement and selective etching operations which reduces the challenge of making an exacting 180.degree. phase shifting mask. An attenuated phase shift mask structure is also disclosed in the present invention.