The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 22, 2000

Filed:

Jul. 07, 1997
Applicant:
Inventors:

Yuji Hayashi, Inagi, JP;

Steven L Suib, Storrs, CT (US);

Hiroshige Matsumoto, Storrs, CT (US);

Masao Hiyane, Yokohama, JP;

Shuji Tanabe, Nagasaki, JP;

Assignees:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H05F / ;
U.S. Cl.
CPC ...
204170 ; 204164 ; 31511121 ; 422168 ;
Abstract

A gas reactor includes a dielectric casing made of a dielectric material and forming a first conduit for directing first gas in one direction, a first electrode positioned inside the dielectric casing along a general center thereof and extending in the direction, at least one catalyst layer formed on a surface of the first electrode, and a second electrode surrounding an outer wall of the dielectric casing. The gas reactor further includes a power-supply unit applying AC power between the first electrode and the second electrode to generate glow discharge inside the dielectric casing.


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Hayashi, Yuji. (2000). Gas reactor for plasma discharge and catalytic action (U.S. Patent No. 6027617). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6027617

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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