The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 22, 2000

Filed:

Jul. 02, 1998
Applicant:
Inventor:

Thomas J Suleski, Charlotte, NC (US);

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B44C / ; B44C / ; B32B / ; B41M / ;
U.S. Cl.
CPC ...
156230 ; 156232 ; 156240 ; 156247 ; 156289 ; 427152 ; 216 41 ;
Abstract

Optical structures are replicated in photoresist on a substrate using a stamp. The transfer of the pattern into the liquid photoresist and the provision on the substrate can be achieved using manual pressures. Various techniques may be used to remove air from the liquid photoresist. The stamp is removed once the liquid photoresist is fully solidified. These structures in solidified photoresist may serve as optical elements or may be accurately transferred into the substrate. The stamp may be for an entire wafer.


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