The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 15, 2000
Filed:
Jul. 17, 1997
Applicant:
Inventor:
Steven Douglas Slonaker, San Mateo, CA (US);
Assignee:
Other;
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G03F / ;
U.S. Cl.
CPC ...
430 30 ; 430311 ;
Abstract
The layer of photoresist on a substrate to be exposed is deformed to approximate the shape of the region of best focus of the image to be projected thereon. The region of best focus is projected into a central region of the resist throughout the exposure field of the image. The deformation is accomplished by conforming the substrate with vacuum to a smoothly curved or spherically curved, permanent, rigid surface in a substrate chuck holding the substrate. The substrate chuck is mounted for motion on a substrate stage so that multiple exposure fields may be formed in the resist.