The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 15, 2000
Filed:
Sep. 19, 1996
Naoko Matsuda, Hirakata, JP;
Hiroyuki Naka, Osaka, JP;
Motoaki Kamihara, Neyagawa, JP;
Osamu Hirota, Kodoma, JP;
Keinosuke Kanashima, Osaka, JP;
Hiroshi Ogura, Machida, JP;
Matsushita Electric Industrial Co., Ltd., Osaka-fu, JP;
Abstract
The present invention provides an apparatus which is capable of discharging a process liquid to a rotating substrate at a very constant rate irrespective of variations in the state of the process liquid. A process liquid is discharged toward a rotating substrate by nozzles which are moved from inner to outer radius sides of the rotating substrate. The present invention further provides a method in which film thickness control conditions are determined based on a simulation of a behavior of a process liquid on a substrate.