The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 15, 2000
Filed:
Dec. 03, 1997
Applicant:
Inventors:
Hidemasa Tamura, Miyagi, JP;
Norio Yokoyama, Miyagi, JP;
Eiichi Shimizu, Miyagi, JP;
Fumio Sasaki, Miyagi, JP;
Assignee:
Sony Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C / ; C22C / ;
U.S. Cl.
CPC ...
20429812 ; 20429813 ; 2041921 ; 420417 ; 148421 ;
Abstract
The present invention provides a sputtering target which generates a reduced quantity of particles during a sputtering and a method for producing such a sputtering target. Mirror treatment is carried out to a sputter surface 2 which is sputtered when forming a thin film, so that the sputter surface 2 has an arithmetic mean roughness Ra of 0.01 .mu.m or below. A sputtering target 1 with such a smooth sputter surface 2 having a small surface roughness enables to reduce a number of particles generated during a sputtering.