The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 15, 2000

Filed:

Sep. 24, 1998
Applicant:
Inventors:

Tsukasa Nakano, Han'nan, JP;

Tomoya Tanaka, Kainan, JP;

Takafumi Kimura, Naga-gun, JP;

Yoshifumi Nakamura, Naga-gun, JP;

Junichi Miyai, Wakayama, JP;

Assignee:

Noritsu Koki Co,. Ltd., Wakayama, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03D / ;
U.S. Cl.
CPC ...
396636 ; 396641 ;
Abstract

A photograph developing apparatus includes a main processing tank and a sub-tank which is connected to the main processing tank. The sub-tank is provided with a filter, a sensor, and the like in order to filter processing solution and feed the filtered processing solution back to the main processing tank. The sub-tank has a lid for covering the top of the sub-tank. The lid has an evaporation prevention block which is extended to a point below the surface of the processing solution. Cavity portions are formed in the evaporation prevention block at least at positions corresponding to the filter and the sensor. Alternatively, evaporation of the processing solution is suppressed through employment of an evaporation prevention block which floats on the surface of the processing solution. In this case as well, cavity portions are formed in the block at least at positions corresponding to the filter and the sensor.


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