The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 08, 2000
Filed:
Aug. 10, 1998
Sunil N Shabde, Cupertino, CA (US);
Yowjuang William Liu, San Jose, CA (US);
Ting Yiu Tsui, Palo Alto, CA (US);
Advanced Micro Devices, Inc., Sunnyvale, CA (US);
Abstract
A system for detecting defects in an interlayer dielectric (ILD) interposed between two conductive lines is provided. The system includes a processor for controlling general operations of the system. The system also includes a voltage source adapted to apply a bias voltage between the two conductive lines and induce a leakage current across the ILD. The system employs a light source to illuminate at least a portion of the ILD and enhance the leakage current. A current source is used to measure the induced leakage current, the current source being operatively coupled to the processor. The processor determines the existence of a defect in the ILD based on the measured leakage current.