The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 08, 2000

Filed:

Oct. 22, 1997
Applicant:
Inventors:

Hitoshi Shindo, Hadano, JP;

Akira Okita, Yamato, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L / ; C30B / ; H01B / ;
U.S. Cl.
CPC ...
438 21 ; 438 30 ; 438751 ; 438756 ; 438757 ; 216 23 ; 216 27 ; 216 51 ; 216 95 ;
Abstract

A process for producing an electronic device having a silicon nitride film on a substrate is provided which comprises steps of forming a silicon nitride film and a silicon oxide film on a first face and a second face reverse to the first face of the substrate respectively, removing the silicon oxide film on the first face by wet etching, removing the silicon nitride film on the first face by wet etching, and removing the silicon oxide film on the second face by wet etching.


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